The Definitive Guide to Noohapou
The Definitive Guide to Noohapou
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The POU3500 program presents dynamic temperature control of the method chamber cathode / electrode / anode and may be synchronized with any etch course of action.
thirty% of its peak power intake, featuring our shoppers considerable reduction in functioning prices and improved reliability.
the knowledge beneath is classified by semiconductor method and Instrument producer. Each and every desk features an purposes Matrix that reveals qulified and commercial procedures.
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This extraordinary technique, supplying a small form variable, low Cost-of-Ownership and Dynamic Temperature Command available course of action and products engineers a completely new Device to enhance their temperature sensitive procedures.
The precision on the POU 3300 permits impartial Charge of the procedure fluid temperature to your wafer chuck inside +/- 0.1 °C of established point, and also the quick Noohapou reaction time from the program makes it possible for for max wafer-to-wafer repeatability throughout the etch method.
The accuracy with the POU 3500 permits independent control of the method fluid temperature for the wafer chuck inside of +/- 0.one °C of established place, along with the rapidly response time of your procedure makes it possible for for maximum wafer-to-wafer repeatability through the entire etch method.
Along with the POU3300, it is possible to reach unparalleled ends in etch overall performance, chamber uptime, lessened price of ownership and fab House utilization – all when bettering your system trustworthiness.
The data pertains to the 300mm chamber temperature profile during a high component ratio Etch course of action, working at really substantial RF electric power problems (~3.8kW). The powerful components of this info established are:
LAUDA-Noah is Conference these new challenges and it has included Power conserving technological know-how in programs which have been pleasant to the ecosystem and possess a low priced to operate.
the info established here is from a 200mm quantity manufacturing wafer fab and Obviously illustrates the advantage of the LAUDA-Noah POU procedure.
The POU3300 system features dynamic temperature Charge of the process chamber cathode / electrode / anode and might be synchronized with any etch approach.
verified; TEs' represent just one Portion of a chiller's design. The switching & control approaches used by a chiller will effects the TEs' reliability.
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